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Such complex technology is required due to unique characteristics of semiconductors. Based on the electrical conductivity level, matter is divided into conductor, semiconductor, and nonconductor. In the case of semiconductors, the electrical conductivity level increases when impurities are added. Semiconductors can also temporarily obtain electrical conduction when thermal energy or light source is added. Using these characteristics, scientists substitute a phosphorous atom or a boron atom into the silicon crystal to increase the electrical conductivity level, and devices made from semiconductor materials have become integral parts of modern electronic appliances. The existing technology has its limits. The process of “doping” involves adding impurities that alter the electronic properties of a semiconductor material in a controlled way. However, nano-sized particles with the size of 1/100,000th of human hair cannot be doped. Instead of adding impurities, the existing technology merely coats the silicon crystal with an atom of another element, thus nano-sized particles cannot stand the weight of the impurities. Taking this into account, Professor Hyeon Taeg Hwan’s team introduced the idea of adding the nucleus of manganese, which is smaller than the nano particle. As a result, the team successfully developed a way to effectively dope nanocrystals.Experts claim that the new nano chip doping technology paves way for the next generation magnetic semiconductors. The new technology not only promises effective doping of nanocrystals, but can also produce nanoribbons which are important materials for magnetic semiconductors. With more research, the technology is expected to be widely used for the development of next generation magnetic semiconductors. This new nanotechnology amaze the new generation of the 21st century on magnetic semiconductors. visit: http://www.world.kbs.co.kr for more.... |
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Saturday, November 21, 2009
Korean Team Develops the World’s First Nano Chip Doping Technology
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The existing technology has its limits. The process of “doping” involves adding impurities that alter the electronic properties of a semiconductor material in a controlled way. However, nano-sized particles with the size of 1/100,000th of human hair cannot be doped. Instead of adding impurities, the existing technology merely coats the silicon crystal with an atom of another element, thus nano-sized particles cannot stand the weight of the impurities. Taking this into account, Professor Hyeon Taeg Hwan’s team introduced the idea of adding the nucleus of manganese, which is smaller than the nano particle. As a result, the team successfully developed a way to effectively dope nanocrystals.
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